Design and Construction of a Compact Rotary Substrate Heater for Deposition Systems

We have designed and constructed a compact rotary substrate heater for the temperature range of 25 °C to 700 °C. The heater can be implemented in any deposition system where crystalline samples are needed. Its main function is to provide heat treatment in situ during film growth. The temperature i...

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Autor Principal: Perez, Israel
Outros autores: Elizalde Galindo, Jose Trinidad, Netro, Tareik
Formato: Artículo
Idioma:en_US
Publicado: 2020
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Acceso en liña:https://doi.org/10.1186/s12645-020-00060
https://cdnsciencepub.com/doi/abs/10.1139/cjp-2019-0530
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