Influence of post‑deposition annealing on the chemical states of crystalline tantalum pentoxide films

We investigate the effect of post-deposition annealing (for temperatures from 848 K to 1273 K) on the chemical properties of crystalline Ta2O5 films grown on Si(100) substrates by radio frequency magnetron sputtering. The atomic arrangement, as determined by X-ray diffraction, is predominately hexag...

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Main Author: Perez, Israel
Other Authors: Sosa, Victor
Format: Artículo
Language: en_US
Published: 2018
Subjects:
XPS
Online Access: http://cathi.uacj.mx/20.500.11961/7995
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