Design and Construction of a Compact Rotary Substrate Heater for Deposition Systems

We have designed and constructed a compact rotary substrate heater for the temperature range of 25 °C to 700 °C. The heater can be implemented in any deposition system where crystalline samples are needed. Its main function is to provide heat treatment in situ during film growth. The temperature i...

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Bibliographic Details
Main Author: Perez, Israel
Other Authors: Elizalde Galindo, Jose Trinidad, Netro, Tareik
Format: Artículo
Published: 2020
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