Design and Construction of a Compact Rotary Substrate Heater for Deposition Systems
We have designed and constructed a compact rotary substrate heater for the temperature range of 25 °C to 700 °C. The heater can be implemented in any deposition system where crystalline samples are needed. Its main function is to provide heat treatment in situ during film growth. The temperature i...
Gorde:
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| Beste egile batzuk: | , |
| Formatua: | Artículo |
| Hizkuntza: | en_US |
| Argitaratua: |
2020
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| Gaiak: | |
| Sarrera elektronikoa: | https://doi.org/10.1186/s12645-020-00060 https://cdnsciencepub.com/doi/abs/10.1139/cjp-2019-0530 |
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