Design and Construction of a Compact Rotary Substrate Heater for Deposition Systems
We have designed and constructed a compact rotary substrate heater for the temperature range of 25 °C to 700 °C. The heater can be implemented in any deposition system where crystalline samples are needed. Its main function is to provide heat treatment in situ during film growth. The temperature i...
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| Médium: | Artículo |
| Jazyk: | en_US |
| Vydáno: |
2020
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| On-line přístup: | https://doi.org/10.1186/s12645-020-00060 https://cdnsciencepub.com/doi/abs/10.1139/cjp-2019-0530 |
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