Effect of ion bombardment on the chemical properties of crystalline tantalum pentoxide films
The effect of argon ion bombardment on the chemical properties of crystalline Ta2O5 films grown on Si(100) substrates by radio frequency magnetron sputtering was investigated by X-ray photoelectron spectroscopy. All samples were irradiated for several time intervals [(0.5, 3, 6, 9) min] and the Ta...
Saved in:
| 主要作者: | |
|---|---|
| 其他作者: | , , , , |
| 格式: | Artículo |
| 語言: | English |
| 出版: |
2019
|
| 主題: | |
| 在線閱讀: | https://doi.org/10.1016/j.vacuum.2019.04.037 https://doi.org/10.1016/j.vacuum.2019.04.037 |
| 標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
成為第一個發表評論!