Influence of post‑deposition annealing on the chemical states of crystalline tantalum pentoxide films

Influence of post‑deposition annealing on the chemical states of crystalline tantalum pentoxide films

We investigate the effect of post-deposition annealing (for temperatures from 848 K to 1273 K) on the chemical properties of crystalline Ta2O5 films grown on Si(100) substrates by radio frequency magnetron sputtering. The atomic arrangement, as determined by X-ray diffraction, is predominately hexag...

पूर्ण विवरण

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ग्रंथसूची विवरण
मुख्य लेखक:	Perez, Israel
अन्य लेखक:	Sosa, Victor, Gamboa, Fidel, Elizalde Galindo, Jose Trinidad, Mani Gonzalez, Pierre Giovanni, Farias, Rurik, Enriquez Carrejo, Jose Luis
स्वरूप:	Artículo
भाषा:	en_US
प्रकाशित:	2018
विषय:	XPS Sputtering Tantalum Pentoxide info:eu-repo/classification/cti/1
ऑनलाइन पहुंच:	https://doi.org/10.1007/s00339-018-2198-9 https://doi.org/10.1007/s00339-018-2198-9
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