Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) of trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. The chemical properties are...

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Övriga upphovsmän: Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Hughes, Gregory, Weiland, C, Woicik, Joshep, Shiel, Kyle, Ornelas, Carlos, Solis-Canto, Óscar, Cherkaoui, K, Hurley, P, Yadav, Pravind, Morris, Michael, McGlynn, Enda, O'Connor, Rob
Materialtyp: Artículo
Språk:English
Publicerad: 2022
Ämnen:
info:eu-repo/classification/cti/7
Länkar:https://doi.org/10.1016/j.mee.2022.111888
https://www.sciencedirect.com/science/article/pii/S0167931722001824
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