Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) of trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. The chemical properties are...

Full description

Saved in:
Bibliographic Details
Other Authors: Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Hughes, Gregory, Weiland, C, Woicik, Joshep, Shiel, Kyle, Ornelas, Carlos, Solis-Canto, Óscar, Cherkaoui, K, Hurley, P, Yadav, Pravind, Morris, Michael, McGlynn, Enda, O'Connor, Rob
Format: Artículo
Published: 2022
Online Access:
Tags: Add Tag
No Tags, Be the first to tag this record!

Similar Items