Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) of trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. The chemical properties are...

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Detalhes bibliográficos
Outros Autores: Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Hughes, Gregory, Weiland, C, Woicik, Joshep, Shiel, Kyle, Ornelas, Carlos, Solis-Canto, Óscar, Cherkaoui, K, Hurley, P, Yadav, Pravind, Morris, Michael, McGlynn, Enda, O'Connor, Rob
Formato: Artículo
Idioma:English
Publicado em: 2022
Assuntos:
info:eu-repo/classification/cti/7
Acesso em linha:https://doi.org/10.1016/j.mee.2022.111888
https://www.sciencedirect.com/science/article/pii/S0167931722001824
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