Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration
The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) of trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. The chemical properties are...
में बचाया:
अन्य लेखक: | Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Hughes, Gregory, Weiland, C, Woicik, Joshep, Shiel, Kyle, Ornelas, Carlos, Solis-Canto, Óscar, Cherkaoui, K, Hurley, P, Yadav, Pravind, Morris, Michael, McGlynn, Enda, O'Connor, Rob |
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स्वरूप: | Artículo |
भाषा: | English |
प्रकाशित: |
2022
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विषय: | |
ऑनलाइन पहुंच: | https://doi.org/10.1016/j.mee.2022.111888 https://www.sciencedirect.com/science/article/pii/S0167931722001824 |
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