Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration

The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) of trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. The chemical properties are...

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Gorde:
Xehetasun bibliografikoak
Beste egile batzuk: Snelgrove, Matthew, Mani Gonzalez, Pierre Giovanni, McFeely, Caitlin, Hughes, Gregory, Weiland, C, Woicik, Joshep, Shiel, Kyle, Ornelas, Carlos, Solis-Canto, Óscar, Cherkaoui, K, Hurley, P, Yadav, Pravind, Morris, Michael, McGlynn, Enda, O'Connor, Rob
Formatua: Artículo
Hizkuntza:English
Argitaratua: 2022
Gaiak:
info:eu-repo/classification/cti/7
Sarrera elektronikoa:https://doi.org/10.1016/j.mee.2022.111888
https://www.sciencedirect.com/science/article/pii/S0167931722001824
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