Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration
The growth chemistry and electrical performance of 5 nm alumina films, fabricated via the area-selective vapor phase infiltration (VPI) of trimethylaluminum into poly(2-vinylpyridine), are compared to a conventional plasma enhanced atomic layer deposition (PEALD) process. The chemical properties are...
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| Other Authors: | , , , , , , , , , , , , , , |
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| Format: | Artículo |
| Language: | English |
| Published: |
2022
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| Subjects: | |
| Online Access: | https://doi.org/10.1016/j.mee.2022.111888 https://www.sciencedirect.com/science/article/pii/S0167931722001824 |
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