Effect of ion bombardment on the chemical properties of crystalline tantalum pentoxide films
The effect of argon ion bombardment on the chemical properties of crystalline Ta2O5 films grown on Si(100) substrates by radio frequency magnetron sputtering was investigated by X-ray photoelectron spectroscopy. All samples were irradiated for several time intervals [(0.5, 3, 6, 9) min] and the Ta...
Gardado en:
| Autor Principal: | |
|---|---|
| Outros autores: | , , , , |
| Formato: | Artículo |
| Idioma: | English |
| Publicado: |
2019
|
| Subjects: | |
| Acceso en liña: | https://doi.org/10.1016/j.vacuum.2019.04.037 https://doi.org/10.1016/j.vacuum.2019.04.037 |
| Tags: |
Engadir etiqueta
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!
|
Sexa o primeiro en deixar un comentario!